材料表征原版系列丛书：光学材料的表征

图书标准信息

• 作者 [美]布伦德尔（Brundle C.R.）、[美]埃文斯（Evans C.A.）、[美]伊莎霍斯（Exarhos G.J.） 编
• 出版社 哈尔滨工业大学出版社
• 出版时间 2014-01
• 版次 1
• ISBN 9787560342795
• 定价 78.00元
• 装帧 平装
• 开本 16开
• 纸张 胶版纸
• 页数 211页
• 正文语种 英语
• 丛书 材料表征原版系列丛书

【内容简介】

　　CharacterizationinOptica/Materia/sprovidesinformationforunderstandingthepropertiesandperformanceofopticalmaterialsundertheinfluenceofthevariouscharacterizationtechniques.Surfaceandinterfacialpropertiesarekeytotheopticalresponseofamaterial，andtheircontrolandmodificationduringmaterialsprocessingisnecessarytoachievedesiredbehavior.CharacterizationofOptica/Materia/sfocusesonhowsurfacemorphology，microstructure，andchemicalbondinginfluencetheopticalresponseofamaterial，anditilluminatesmethodsusedtocharacterizethinfilms，multilayerstructures，andmodifiedsurfaces，

【目录】

PrefacetotheReissueoftheMaterialsCharacterizationSeries
PrefacetoSeries
PrefacetotheReissueofCharacterizationofOpticalMaterials
Preface
Contributors
INTRODUCTION

PART1INFLUENCEOFSURFACEMORPHOLOGYAND
MICROSTRUCTUREONOPTICALRESPONSE
CHARACTERIZATIONOFSURFACEROUGHNESS
1.1Introduction
1.2WhatSurfaceRoughnessls
1.3HowSurfaceRoughnessAffctsOpticaIMeasurements
1.4HowSurfaceRoughnessandScatteringAreMeasured
1.5CharacterizationofSelectedSurfaces
1.6FutureDifections

CHARACTERIZATIONOFTHENEAR-SURFACEREGIONUSINGPOIARIZATION-SENSITIVEOPTICALTECHNIQUES
2.1Introduction
2.2Ellipsometry
ExperimentallmplementationsofEllipsometry29,Analysisof
EllipsometryData
2.3MicrostructuralDeterminationsfromEllipsometryData
TemperatureDependenceoftheOpticatPropertiesofSilicon34,
DeterminationoftheOpticalFunctionsofGlassesUsingSE35,
SpectroscopicEllipsometryStudiesofSi02/Si37,Spectroscopic
EllipsometryforComplicatedFilmStrucrures38,Time-Resolved
Ellipsometry40,Single-WavelengthReal-TimeMonitoringofFilm
Growth41,Multiple-WavelengthReal-TimeMonitoringofFilm
Growth42,InfraredEllipsometryStudiesofFilmGrowth

THECOMPOSITION,STOICHIOMETRY,ANDRELATEDMICROSTRUCTUREOFOPTICALMATERIALS
3.1Introduction
3.2AspectsofRamanScattering
3.3III-VSemiconductorSystems
3.4GroupIVMaterials
3.5AmorphousandMicrocrystallineSemiconductors
ChalcogenideGlasses60,GroupIVMicrocrystallineSemiconductors
3.6Summary

DIAMONDASANOPTICALMATERIAL
4.1Introduction
4.2DepositionMethods
4.30pticalPropertiesofCVDDiamond
4.4DefectsinCVDDiamond
4.5PolishingCVDDiamond
4.6X-rayWindow
4.7Summary

PART2STABILITYANDMODIFICATIONOFFILMANDSURFACEOPTICALPROPERTIES
MULTIJAYEROPTICALCOATINGS
5.1Introduction
5.2Single-LayerOpticalCoatings
OpticaIConstants90,CompositionMeasurementTechniques
5.3MultilayerOpticalCoatings
CompositionaIAnalysis107,SurfaceAnalyticaITechniques108,
MicrostructuralAnalysisofMultilayerOpticalCoatings
5.4StabilityofMultilayerOpticalCoatings
5.5FutureCompositionaland
MicrostructuralAnalyticaITechniques

CHARACTERIZATIONANDCONTROLOFSTRESSINOPTICALFILMS
6.1Introduction
6.20riginsofStress
……