微机电器件设计、制造及计算机辅助设计/北京航空航天大学“研究生英文教材”系列丛书
9787512421097微机电器件设计、制造及计算机辅助设计2016-5-1
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九五品
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作者郭占社 著
出版社北京航空航天大学出版社
出版时间2016-06
版次1
装帧平装
货号122
上书时间2023-08-18
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图书标准信息
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作者
郭占社 著
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出版社
北京航空航天大学出版社
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出版时间
2016-06
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版次
1
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ISBN
9787512421097
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定价
65.00元
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装帧
平装
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开本
16开
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纸张
胶版纸
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页数
272页
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丛书
京航空航天“研究生英文教材”系列丛书
- 【内容简介】
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Thisbookfirstlyintroducesthepertinentfundamentaltheory,importantmaterialandfabricationprocessofmicroGelectromechanicalsystems.Basedonthesetheories,thedesignruleandimportantengineeringexamplesaredescribedindetail.Then,manyengineeringapplicationsforMEMSincludingtheaccelerationmeasurement,theangularspeedmeasurementandthepressuremeasurementareintroduced.Finally,finiteelementmethodisintroducedinordertoprovethecorrectnessofthedesign.Thisengineeringapplicationofsimulationincludesthestaticandmodalanalysisofthebeam,capacitanceanalysis,thermalGstructureanalysisofthedeviceandfatigueanalysisetc.Itcanbeselectedasthereferencetothepostgraduates,undergraduatesandpertinentengineeringstaffwhoseresearch directionsareinstrumentationscienceandtechnology,controlscienceandengineering,mechanicalengineeringetc.
- 【目录】
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Chapter1 Introduction ………………………………………………………………………… 1
1.1 ConceptofMEMS ……………………………………………………………………… 1
1.2 DevelopmentofMEMS ………………………………………………………………… 4
1.3 MEMSCAD …………………………………………………………………………… 9
Chapter2 BasictheoryofMEMS …………………………………………………………… 12
2.1 TheoryofelectrostaticMEMScombactuators …………………………………… 12
2.1.1 Introduction ……………………………………………………………………… 12
2.1.2 Operatingprinciples …………………………………………………………… 13
2.1.3 Platecapacitortheoryinidealcondition ……………………………………… 14
2.1.4 ThemodifiedmodelofMEMSplatecapaciator ……………………………… 17
2.1.5 Calculationofelectrostaticcombdrivingforceinidealsituation …………… 24
2.1.6 Weakcapacitancedetectionmethodofelectrostaticcombdrive …………… 26
2.2 RelevanttheoreticalcalculationsfortheMEMScantileverbeam ………………… 34
2.2.1 Introduction ……………………………………………………………………… 34
2.2.2 Theoreticalcalculationmethodforcantileverbeam ………………………… 35
2.2.3 RelevanttheoreticalcalculationofaxialtensileandcompressiveonsingleGend
clampedbeams ………………………………………………………………… 36
2.2.4 RelatedtheoreticalcalculationsofdoubleGendclampedbeamsaxialtension
andcompression ………………………………………………………………… 40
2.3 MembranetheoryofMEMS ………………………………………………………… 47
2.3.1 Theoryofclampedaroundcirculardiaphragm ………………………………… 48
2.3.2 Theoryofclampedaroundrectangularflatdiaphragm ……………………… 49
References …………………………………………………………………………………… 52
Chapter3 MEMSmaterials …………………………………………………………………… 53
3.1 Monocrystallinesilicon ……………………………………………………………… 53
3.1.1 Introduction ……………………………………………………………………… 53
3.1.2 Crystalorientationofmonocrystallinesilicon ………………………………… 55
3.2 Polycrystallinesilicon ………………………………………………………………… 64
3.3 Silica …………………………………………………………………………………… 66
3.4 Piezoelectricmaterials ………………………………………………………………… 67
3.4.1 Piezoelectriceffectandinversepiezoelectriceffectofmaterials …………… 67
3.4.2 Quartzcrystal …………………………………………………………………… 68
3.4.3 Piezoelectricceramics …………………………………………………………… 73
3.5 OtherMEMSmaterials ……………………………………………………………… 75
3.6 Summary ……………………………………………………………………………… 76
Chapter4 MEMStechnology ………………………………………………………………… 77
4.1 MEMSlithographyprocess ………………………………………………………… 78
4.2 KeytechnologyofMEMSlithographyprocess …………………………………… 80
4.2.1 Wafercleaning …………………………………………………………………… 80
4.2.2 Siliconoxidation ………………………………………………………………… 80
4.2.3 Spincoatingprocess …………………………………………………………… 87
4.2.4 Prebaking ………………………………………………………………………… 90
4.2.5 Exposure ………………………………………………………………………… 92
4.2.6 Development ……………………………………………………………………… 94
4.2.7 Hardening ………………………………………………………………………… 96
4.2.8 FabricationoftheSiO2 window ………………………………………………… 97
4.3 SubsequentprocessofMEMS ……………………………………………………… 98
4.3.1 Bulksilicontechnology ………………………………………………………… 98
4.3.2 Surfacesiliconprocess ………………………………………………………… 103
4.3.3 LIGAtechnology ……………………………………………………………… 104
4.3.4 Sputteringtechnology ………………………………………………………… 105
4.3.5 LiftGoffprocess ………………………………………………………………… 107
4.4 Filmpreparationtechnology………………………………………………………… 107
4.5 Bondingprocess ……………………………………………………………………… 108
4.5.1 Anodicbondingprocess………………………………………………………… 109
4.5.2 SiliconGsilicondirectbonding ………………………………………………… 110
4.5.3 Metaleutecticbonding ………………………………………………………… 113
4.5.4 Coldpressureweldingbonding ……………………………………………… 114
4.6 Engineeringexamplesofcombinationformultipleprocessestofabricatethe
MEMSdevice ………………………………………………………………………… 115
4.6.1 Introduction …………………………………………………………………… 115
4.6.2 EngineeringexampleoffabricationprocessforresonantMEMSgyroscope
…………………………………………………………………………………… 115
4.6.3 EngineeringexampleofelectromagneticmicroGmotorproductionprocess
…………………………………………………………………………………… 118
4.7 Summary ……………………………………………………………………………… 124
References…………………………………………………………………………………… 125
Chapter5 Frictionwearandtearundermicroscale ……………………………………… 126
5.1 OffGchiptestingmethodformicrofriction ………………………………………… 127
5.1.1 MicroGtribologytestwiththepinGonGdiscmeasuringmethod ……………… 127
5.1.2 MicroGtribologytestwithAFM ……………………………………………… 128
5.1.3 MicroGtribologytestwithspecialmeasuringdevice ………………………… 130
5.2 OnGchiptestingmethodformicrofriction ………………………………………… 132
5.2.1 OnGchiptestingmethodactuatedbyelectrostaticforce …………………… 132
5.2.2 OnGchipmicroGfrictiontestingmethodusingthemechanismcharactersof
thebimorphmaterial…………………………………………………………… 139
5.3 ExampleofthedesignforanonGchipmicroGfrictionstructure ………………… 141
5.3.1 Structureandworkingprinciple ……………………………………………… 141
5.3.2 Calculationofpertinenttheory ……………………………………………… 142
5.3.3 Technologicalanalysisofstructuraldesign ………………………………… 148
5.3.4 Testingresultsanddataanalysis……………………………………………… 152
5.3.5 ResearchandtestofwearproblemofMEMSdevices ……………………… 161
5.4 Summary ……………………………………………………………………………… 165
References…………………………………………………………………………………… 165
Chapter6 MEMStestingtechnologyandengineeringapplication ………………………… 169
6.1 Accelerationmeasurementandcorrespondingsensors …………………………… 169
6.1.1 Workingprincipleoftheaccelerationsensorandtheclassification ……… 170
6.1.2 Capacitivesiliconmicromechanicalaccelerometer …………………………… 172
6.1.3 Piezoresistivesiliconmicromechanicalaccelerometer ……………………… 173
6.1.4 Piezoelectricmicromechanicalaccelerometer ………………………………… 174
6.1.5 ResonantsiliconMEMSaccelerometer ……………………………………… 175
6.2 Angularspeedmeasurementandcorrespondingsensors ………………………… 177
6.2.1 Workingprinciple ……………………………………………………………… 177
6.2.2 DevelopmentofMEMSgyroscope …………………………………………… 178
6.2.3 Classificationofmicromechanicalgyroscope ………………………………… 188
6.3 Pressuremeasurementandcorrespondingsensors ……………………………… 190
6.3.1 Workingpincinple ……………………………………………………………… 190
6.3.2 Resonantsiliconmicromechanicalpressuresensoranditsdevelopment … 193
6.4 MeasurementofmicroGtorque ……………………………………………………… 198
6.4.1 Introduction …………………………………………………………………… 198
6.4.2 Workingprincipleofnoncontactmethod …………………………………… 199
6.4.3 Theoreticalcalculation ………………………………………………………… 200
6.4.4 Correspondingequipmenttorealizethenoncontactmethod ……………… 205
6.4.5 Experimentresultanddiscussion …………………………………………… 209
6.5 Microscopicmorphologytestingmethod ………………………………………… 211
6.6 Summary ……………………………………………………………………………… 212
References…………………………………………………………………………………… 212
Chapter7 Applicationexamplesofthefiniteelementmethodinthedesignof
MEMSdevices …………………………………………………………………… 218
7.1 Importantconceptsofthesoftware………………………………………………… 218
7.2 IntroductionoftheAnsyssoftwareinterface……………………………………… 220
7.3 ThecoordinatesysteminAnsys …………………………………………………… 221
7.4 Engineeringexamples ……………………………………………………………… 226
7.4.1 StaticanalysisofsingleGclampedbeam ……………………………………… 226
7.4.2 ModalanalysisofdoubleGclampedbeam ……………………………………… 245
7.4.3 CapacitanceanalysisofMEMSelectrostaticcombfingersdrive …………… 257
7.4.4 Fatiguestrengthcalculationexample ………………………………………… 264
7.5 Summary ……………………………………………………………………………… 272
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